Anchor Semiconductor Introduces NanoScope Pattern-Based OPC Acceleration Tool
By pur, Thursday, February 12th, 2009
Category: Electronic Design Automation, EDA
NanoScope[tm] Pattern-Based Optical Proximity Correction (OPC) Accelerator (POA) was developed in collaboration with Anchor’s leading-edge customers and is a natural application extension of the company’s NanoScope[tm] pattern-centric platform. NanoScope[tm] POA is a significant cost and time saving tool for model-based OPC. The tool provides users at least 10 times the performance gain for logic designs over conventional OPC flow. NanoScope[tm] POA accelerates the process by pattern based OPC reuse which does not require additional work on models and recipes, the most time consuming areas of OPC tool qualification…
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